Colloidal silica polishing fluids are mainly suitable for high-precision polishing of silicon slice, SiC, piezoelectric ceramics, CTZ, MCT, InP, GaAs and other materials.
Chemical polishing fluid is mainly suitable for high-precision polishing of GaAs, CTZ, MCT and other similar materials, and are most effective when the material has an orange peel effect.
The product appearance of colloidal silica polishing fluid and chemical polishing fluid is opaque liquid, the PH value of colloidal silica polishing fluid is (AtG/1H2O) 5.0-10.1, the PH value of chemical polishing fluid is 11.4, the main content is NaOCI: 7-8%, AlO: 8-10%, it according to the sample to meet the requirements of colloidal silica polishing fluid and chemical polishing fluid.