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Suitable for CMP chemical mechanical polishing heads,wafer lapping discs,optical mold substrates,precision bearing end faces and semiconductor vacuum adsorption platforms

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Optical interferometry technology applied to measure the flatness of materials

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Supportive of rapid non-destructive testing

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Fast,easy,precise and highly repeatable

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Qualitative analysis of interference fringe images

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The grazing-incidence interferometry technology supporting a longitudinal resolution of 10 nm and a dynamic measurement range of 100 μm

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It takes only seconds to complete one-time interferometric imaging with a large field of view: 150 mm full-aperture measurement






