GAND-T Lapping and Polishing System
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High machining accuracy，with TTV≤2 um and RA ≤0.1 nm
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Suitable for processing of various special-shaped wafers below 6 inches
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Fitted with a disk-typed bluetooth unit for monitoring and automatic repair
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Pressure accuracy of the fixture reaching 2g/cm² and customizable pressurization module
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Enclosed working area for adaptivity to high purification level environments
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Editable to store at least 100 processes
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Capable of temperature control，such as tray temperature monitoring and automatic cooling
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Equipped with water gun，air gun and other flushing systems，efficient cleaning
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