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How to ensure the consistency of the removal efficiency of the two materials during the lapping process of TSV through-silicon via

In the lapping process of TSV (Through-Silicon Via) process, ensuring the consistent removal efficiency of the two materials (such as silicon substrate and overlay material) is a key link to ensure the quality and process stability of the final product.
以下是一些实现这一目标的方法和策略:
1. Precise control of lapping parameters lapping pressure and speed: By precisely adjusting the pressure, rotation speed and material of the lapping head of the lapping machine, fine control of different material removal rates can be achieved. The optimization of these parameters requires the use of multiple experiments to find the most suitable combination for the current material based on experimental data.
2. Use the right lapping medium**Slurry & Abrasives**: Choosing the right slurry and abrasives is an important factor in ensuring lapping efficiency and quality. The slurry should have good chemical stability and lubricity to reduce friction and heat generation during the lapping process. At the same time, the hardness and particle size of the abrasive should be selected according to the characteristics of the material being abrasive, so as to ensure that the removal rate of the two materials is similar.
3. Real-time monitoring and feedback adjustment**Online monitoring**: During the lapping process, online monitoring technology (such as laser measurement, force sensor, etc.) can be used to monitor the removal rate and surface quality of the material in real time. As soon as a deviation in the removal rate of the two materials is detected, the lapping parameters can be adjusted immediately or the grinding medium can be changed to ensure consistent removal efficiency.
4. Uniformity control**Process design**: In the process design stage, the uniformity of the material should be fully considered. By optimizing wafer mounting, lapping path planning, and more, the material removal rate is consistent across the entire wafer surface. This helps to reduce quality issues due to uneven local removal rates.
ConclusionIn summary, the key to ensuring the consistent removal efficiency of the two materials during the TSV through-hole process lapping process is to accurately control the grinding parameters, use the appropriate lapping media, real-time monitoring and feedback adjustment, optimize the process design, and implement strict quality control. These measures work together at different points in the lapping process to ensure the quality and process stability of the final product.

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